- 13 January 2006 -
ASM first to enter China with 300 mm epi system
ASM International N.V. of Bilthoven, The Netherlandshas sold the world’s first 300 mm epitaxial reactor into mainland China. The system, shipped in Q4/2005, was ordered by Beijing-based General Research Institute for Nonferrous Metals (GRINM), one of the largest Chinese research institutes for semiconductor-related applications.
“Although initially used for 12-inch silicon epitaxial wafers, the Epsilon® 3200 system going into our Beijing facility was chosen specifically to expand into studies of SiGe, strained silicon as well as other new research areas,” said GRINM’s president, Dr Hailing Tu.
The main use of the Epsilon 3200 is for epitaxial growth of silicon and SiGe alloys. This includes advanced blanket and selective epitaxial growth processes for recessed and elevated source/drain structures as used in state-of-the-art CMOS transistors, as well as the integration of strained silicon in SOI wafer technology.
“ASM’s presence in China’s epitaxial market is well established with over 60 percent market share,” said Dr Armand Ferro, ASM’s Epsilon Business Unit Manager. “The addition of GRINM to our customer base is a huge win for ASM and plays an important role in our China market strategy, especially since GRINM is engaged in a wide range of government-funded, advanced
scientific and engineering programs, and is capable of spinning off large commercial projects.”
“With GRINM’s adoption of the 300 mm Epsilon and development of advanced applications underway, ASM expects to continue penetration into China’s 300 mm market and remain the main epitaxial equipment supplier for the region,” concluded Ferro.
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