-15 June 2006 -

Improved productivity in metrology

KLA-Tencor has introduced Archer AIM+, its latest overlay metrology solution, which is designed to address chipmakers' lithography overlay control needs beyond the 65-nm node.

Based on the industry benchmark Archer tool platform, Archer AIM+ reduces total measurement uncertainty (TMU) by 50%, and increases tool throughput by up to 20% compared to KLA-Tencor's previous-generation Archer AIM system.

Archer AIM+ is currently being evaluated by leading memory and logic device manufacturers for advanced applications, and has already been chosen as the tool of record at several leading-edge fabs.

Like its predecessor, the Archer AIM+ leverages KLA-Tencor's unique grating-style targets, which are more robust to chemical mechanical planarization processing than box-in-box targets because they have less open area within which CMP processing can cause target degradation.

AIM targets are also denser than traditional box-in-box targets, resulting in the collection of more process information for improved correlation to in-device overlay performance.

For customers that wish to leverage traditional box- style targets, KLA-Tencor also offers the Archer XT+, which includes the same core performance enhancements as the Archer AIM+ but is compatible with box- in-box target measurements.

Archer AIM+ incorporates a new optic system design and improved illumination system, which reduce TMU to within 2.1nm-exceeding the 45-nm node overlay control requirements outlined in the 2004 International Technology Roadmap for Semiconductors.

New software algorithms have also been added to enable high-precision measurements on low contrast and post-CMP layers, which are particularly difficult to measure with traditional overlay control techniques.

Additional improvements, including a faster and more advanced computer that operates on Windows XP, a new wafer handler and optimised algorithms,
enable 20% higher throughput (up to 180 wph) with a 20% reduction in
move-acquired-measure (MAM) time compared to the Archer AIM.

These product enhancements enable the industry's lowest cost-of-ownership (CoO) overlay metrology solution for advanced semiconductor production applications.