Atomic level solutions

ProMOS Technologies of Hsin-chu Science Park, Taiwan has placed a purchase order for a production ALD system from Genus Inc, a member of the Aixtron Group.

The system will initially be used for the volume production of advanced memory devices using 90nm technology at the new ProMOS facility, Fab 3, located at Central Taiwan Science Park.

"Genus was chosen for its excellent production and service record in the 300mm DRAM marketplace. ProMOS also looked for a technology innovator that could help us achieve our most advanced requirements rapidly.

"The tool was installed quickly and has been performing flawlessly to date. The fact that Genus CVD and ALD tools share the same platform and system design simplifies our operations and service," said Dr. Len Mei, senior VPof ProMOS Technologies."

The 300 mm ALD system will also be used for the production of advanced DRAM MIM films for sub-70nm and beyond. This order is a further example of the growing acceptance of Genus ALD process technology and demonstrates the Aixtron Group's ability to supply the market with advanced technologies.

Aixtron is currently focused on extending its silicon customer base in the Taiwanese market. The ALD market is of growing importance for developing and integrating new materials to enable production solutions for semiconductor devices with critical requirements.

Seeking to accelerate the deployment of these material solutions, new innovative Aixtron ALD, AVD, and MOCVD deposition technologies are expected to continue to evolve rapidly.

Genus Inc has also received a repeat order for its advanced 300mm CVD system from ProMOS Technologies. This repeat order was received three months after shipping the first system to this advanced 90nm DRAM site. The tool will support the rapid production ramp and will be shipped in the third quarter of this year.