21st November 2006

Bede Ships BedeMetrix-F with ScribeView for SiGe

Bede X-ray Metrology has shipped another BedeMetrix-F system with ScribeView to a ‘leading US semiconductor manufacturing consortium’. The system for in-line, high volume semiconductor manufacturing will be used to control strain and relaxation in SiGe on product wafer metrology pads for their 45nm process.

Jim Polasik, Chief Operating Officer of Bede X-ray Metrology, said, “I am delighted that we have been chosen by a leading semiconductor manufacturing consortium for their cutting edge metrology needs. The BedeMetrix-F with ScribeView offers advanced strained silicon process control for 65nm technology nodes and below. ScribeView uses the patented Microsource X-ray generator and the latest in X-ray optics technology, and is capable of measurements on test pads and scribe lines down to 60 microns wide on product wafers, thereby eliminating the need for monitor wafers".

Frank Hochstenbach, Global Director of Sales and Marketing said, “In-line process control of strained silicon is becoming mandatory as the technology nodes are shrinking. This consortium will benefit from the only production proven system available for in-line measurement of strained epi-layer composition, thickness and relaxation using high resolution XRD and X-ray reflectivity techniques. There are over 35 tools in production fabs worldwide for this application, and this number will grow as strained silicon is adopted into the production process".

Web:www.bede.co.uk