30th November 2006

First SMI Dragon CVD for SiC Bulk & Oxide for China

Structured Materials Industries, Inc. announced the sale, delivery and installation of its first Dragon CVD tool for the Very High Temperature (through 2200°C) and Low Deposition Pressure (sub-Torr to atmosphere) deposition of SiC bulk material. SMI also announced sale of an oxide MOCVD system to China.

The Dragon CVD tool presents researchers with a significant new tool to research high temperature deposition processes.

It was designed and built in collaboration with Penn State University Electro-Optics Center and addresses both high temperature CVD and PVT.

The system features a double walled chamber with water flowing between the walls, a 50 kW induction heater system with tuned capacitor, wet or dry pumping, turbo pumping, fully automated process control with redundant safety features including spread sheet programming, real time monitoring and trend analysis among other features, gas and metal organic source capabilities and a compact footprint – all at an economical cost.
It complements a growing line of oxide, nitride and carbide tools offered by SMI and should be applicable to a range of nitride and related tools.

SMI also announced sale of an oxide MOCVD system to China. This system will focus on ferroelectric oxide films, principally for non-volatile memory research and development. The tool is capable of depositing films of 8-in (200mm) or 6-in (150mm) diameter wafers. This system is the first of its kind to be installed in China and is a cornerstone in SMI’s growing business base in Asia.

Web: www.structuredmaterials.com