- 21 March 2005 -

Nanometrics gets patent certificate

The US Patent and Trademark Office has issued a ruling that will strengthen one of Nanometrics’ key patents for integrated metrology products.
In response to a patent challenge made by a competitor, the Patent and Trade-mark Office reexamined a Nanometrics patent relating to polar coordinate stage technology.

As a result of the reexamination proceeding, the Patent and Trademark Office issued a Notice of Intent to issue an ex parte reexamination Certificate to Nanometrics, confirming all claims without amendment. The Certificate is expected to solidify Nanometrics’ ownership of this technology and effectively bar competitors from using it..

The reexamined patent – an enabling technology for integrated metrology applications – helps to ensure Nanometrics’ current and future position as a leading advanced process control provider.

“This ruling by the US Patent and Trademark Office confirms Nanometrics’ proprietary right to a technology that is a vital component of our integrated metrology products and the future of advanced process control,” said John Heaton, president and CEO of Nanometrics.

The patent, originally issued to Nanometrics in November 2001, No. 6,320,609, is for a “System using a Polar Coordinate State and continuous image rotation to compensate For stage rotation.”

The patent relates to apparatus and method for controlling a polar coordinate stage that moves the image of an object to compensate for the rotation of the stage. Using polar coordinate motion, this enables smaller, more efficiently integrated metrology modules.

It also provides the benefits of a continuously corrected image, without the size and speed drawbacks of a standard x-y stage in a compact design that has virtually no impact on the process tool’s footprint for easy and efficient integration.