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- 13 September 2006 -
Opto Mid-Week Round-up
There have several significant developments in optoelectronics
in the past few days. After aperiod of quiet another patent
infringement litigation has been revealed. Meanwhile, two
of the datacom component majors have published demonstrations
as to their commitment in areas which will likely affect all
the other players in due course. Firstly, Bookham qualification
labs achieved International Standard ISO/IEC 17025 and second,
JDSU has received Frost & Sullivan's 2006 Growth Strategy
Award for IP Video/IPTV. Finally, HelioVolt and NREL take
the next step in developing nanomaterial-based solar cells.
Cree Files Lawsuit Against
BridgeLux
Cree, Inc., has filed suit against BridgeLux, Inc. (formerly
eLite Optoelectronics) for infringement of U.S. Patent Nos.
6,657,236 (“the ‘236 patent”) and 5,686,738
(“the ‘738 patent”). The suit, which was
filed in the U.S. District Court for the Middle District of
North Carolina, seeks monetary damages and injunctive relief
to prohibit BridgeLux from infringing these patents.
Cree’s ‘236 patent, entitled “Enhanced Light
Extraction in LEDs through the Use of Internal and External
Optical Elements,” relates to light extraction structures
used in LEDs. The ‘738 patent, entitled “Highly
Insulating Monocrystalline Gallium Nitride Thin Films,”
relates to semiconductor devices manufactured using a gallium
nitride-based buffer technology. The ‘738 patent is
owned by the Trustees of Boston University and licensed to
Cree on an exclusive basis. Boston University is a co-plaintiff
in the suit. The ‘738 patent was also the subject of
two prior suits brought by Cree and Boston University against
Nichia Corporation and AXT, Inc., both of which resulted in
settlements.
“Cree’s leadership in LED technology is the result
of significant investment in R&D and our patent portfolio
over the last nineteen years. The filing of this suit demonstrates
Cree's willingness to protect our R&D investments and
patent rights, especially at a time when some segments of
the LED marketplace act as if there are no issues with intellectual
property,” stated Cree chairman and CEO Charles Swoboda.
www.cree.com
Bookham Achieves International
Standard ISO 17025
At Caswell, UK, Bookham, Inc., announced that it has achieved
the International Standard ISO 17025 for testing and calibration.
The achievement means that the company’s reliability
and qualification testing facilities can now provide independent
test data on Bookham products and can offer an independent
testing service to other companies.
The accreditation follows a third party audit of the Bookham
reliability laboratory at Caswell, which assesses all of the
company’s products for reliability and longevity. The
audit, which was conducted by the British Standards Institute
(BSI), confirmed that the quality and reliability data produced
by the laboratory is impartial and satisfies the stringent
standards required.
“Bookham has been assessed by a world-renowned, external
authority, which has confirmed that our laboratory can be
trusted, not only to produce authenticated results for our
own products, but now for the products of other companies,”
said Reiner Breu, VP, Quality and Reliability at Bookham.
“This complements the Bookham existing TL9000 global
accreditation and is another major step forward in the continuous
enhancement of the services we offer our customers. It has
only been possible through continuous commitment and investment
in test equipment, facilities and expertise, and the benefits
are already being seen, with a number of customer audits demonstrating
the high quality of service provided by Bookham.”
To achieve the standard, Bookham has established a separate
service, with its own organisation and line management, that
meets the requirements of ISO 17025. This involved the production
and documentation of a quality management system and quality
management procedures embracing the management and technical
requirements that comprise the standard.
www.bookham.com
JDSU Receives Frost &
Sullivan's 2006 Growth Strategy Award for IP Video/IPTV
Commitment to quality and strong market performance have earned
JDSU has received Frost & Sullivan's 2006 Growth Strategy
Award for IP Video/IPTV. JDSU's diverse IPTV test portfolio
includes solutions for the installation, maintenance and monitoring
of cable and telecom networks as well as lab testing for network
equipment manufacturers.
The Frost & Sullivan Award for Growth Strategy Leadership
is presented each year to a company whose growth strategy
produces high year-to-year growth rates in IPTV. The award
is presented to the company that has bolstered its position
in the market and whose strategy will have a lasting impact
and is based on, among other criteria, implementation of a
unique sales strategy, technological innovation and leadership,
and discovering new venues for an established product.
Recently JDSU announced its latest financials and even though
it narrowed a Q4 loss, the sales forecast fell short of expectations:
the loss fell to $45.8m, or 3 cents a share, from $145.7m,
or 10 cents a share, a year ago. Its sales increased by 86%
to $318m thanks to a major acquisition last year.
www.jdsuniphase.com
HelioVolt and NREL to Continue
Developing Nanomaterial-Based Solar Cells
Building on more than two years of collaboration with the
National Renewable Energy Laboratory (NREL), HelioVolt announced
it will extend the Cooperative Research and Development Agreement
(CRADA) for research carried out at NREL's facilities to include
the development of non-vacuum nanomaterial-based deposition
processes optimized for HelioVolt's proprietary FASST (TM)
manufacturing technology.
The fastest and most efficient way to manufacture thin-film
CIGS photovoltaics, FASST (TM) was recently honoured with
a Nano 50(TM) Award from Nanotech Briefs, a leading nanotechnology
magazine from the publishers of NASA Tech Briefs. Judged by
an independent panel of nanotechnology and MEMS experts, the
Nano 50 award recognizes HelioVolt's process for its significant
near-term impact on the market as well as the field of nanotechnology.
HelioVolt is enabling new paths to solar energy marketability
by building on its knowledge of the unique characteristics
of the Copper Indium Gallium Selenide (CIGS) material system.
As described most accurately so far in a model published by
Dr. B.J. Stanbery, HelioVolt's founder, when made under the
proper conditions CIGS spontaneously arranges itself at the
nanoscale to create a percolation network that drastically
reduces losses, making the material the most efficient and
reliable thin-film for photovoltaics. By taking maximum advantage
of this, HelioVolt's flexible FASST (TM) process can be used
under both vacuum and atmospheric conditions to print photovoltaic
material directly onto traditional construction materials
including architectural glass, steel, roofing and polymers
in 80 to 98 percent less time than conventional processes.
Under the terms of the CRADA, HelioVolt will work with NREL
to optimize both conventional vacuum and pioneering non-vacuum
deposition processes for FASST (TM) manufacturing environments.
"Our collaborative efforts with NREL over the years have
formed the groundwork for a viable new solar paradigm: large
scale production of building materials that are durable, versatile,
visually appealing and capable of economically harvesting
energy from the sun," said HelioVolt president and founder,
Dr. B.J. Stanbery. "NREL's expertise in preparing nanotechnology
precursors is the ideal complement to our own highly-efficient
process for converting those nanoscale building blocks into
finished CIGS thin-film material under both vacuum and atmospheric
conditions."
"As the Department of Energy's laboratory for advancing
renewable energy, NREL is committed to growing the value and
accessibility of solar technology for the mainstream electricity
market," said John Benner, Electronic Materials Group
Manager at NREL's National Center for Photovoltaics. "Our
initial collaboration with HelioVolt indicates that FASST
(TM) enables improved manufacturing time and process flexibility,
and our extended CRADA will help drive those promising results
forward to commercial production."
Many steps in conventional thin-film production require vacuum
deposition, a process by which the thin-film material is coated
onto the substrate in a very low-pressure vacuum chamber.
Vacuum deposition processes can be capital intensive and depositing
CIGS films in particular on large areas with the precision
necessary to achieve both high performance and low manufacturing
costs can be very difficult without the advantages of the
FASST (TM) process. Non-vacuum or atmospheric deposition processes
offer a combination of lower costs, process simplicity and
reduced manufacturing times while still resulting in high-quality
films when used with the HelioVolt's FASST (TM) manufacturing
process which is flexible and highly controllable and thus
capable of being optimized to produce high-quality thin-film
through both atmospheric and vacuum techniques.
www.heliovolt.com
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